We present hole drift-mobility measurements on hydrogenated amorphous silicon from several laboratories. These temperature-dependent measurements show significant variations of the hole mobility for the differing samples. Under standard conditions (displacement/field ratio of 2×10-9 cm2/V), hole mobilities reach values as large as 0.01 cm2/Vs at room-temperature; these values are improved about tenfold over drift-mobilities of materials made a decade or so ago. The improvement is due partly to narrowing of the exponential bandtail of the valence band, but there is presently little other insight into how deposition procedures affect the hole drift-mobility.
"Hole Drift-Mobility Measurements in Contemporary Amorphous Silicon," S. Dinca, G. Ganguly, Z. Lu, E. A. Schiff, V. Vlahos, C. R. Wronski, Q. Yuan, in Amorphous and Nanocrystalline Silicon Based Films - 2003, edited by J.R. Abelson, G. Ganguly, H. Matsumura, J. Robertson, E. A. Schiff (Materials Research Society Symposium Proceedings Vol. 762, Pittsburgh, 2003), pp. 345--350.
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